Chang Eun Lee

Title: Innovations of Chang Eun Lee

Introduction

Chang Eun Lee is a prominent inventor based in Seoul, South Korea. He has made significant contributions to the field of semiconductor technology, holding a total of nine patents. His work focuses on enhancing the performance and efficiency of semiconductor devices.

Latest Patents

One of his latest patents is for a P-type lateral double diffused MOS transistor and the method of manufacturing the same. This PLDMOS transistor features a substrate with a P-type drift region on its upper surface, an N-type body region, and a channel region. It also includes a drain extension region of P-type conductivity and a P-type drain region, all designed to improve the breakdown voltage through reduced surface fields. Another notable patent involves a semiconductor device and its manufacturing method, which includes a first insulation layer, metal patterns, a thin film resistor pattern, and an anti-reflection layer.

Career Highlights

Chang Eun Lee has worked with notable companies such as Dongbu Electronics Co., Ltd. and Dongbu Hitek Co., Ltd. His experience in these organizations has allowed him to develop innovative solutions in semiconductor technology.

Collaborations

He has collaborated with various professionals in the industry, including his coworker Sang Gi Lee.

Conclusion

Chang Eun Lee's contributions to semiconductor technology through his patents and career achievements highlight his role as a leading inventor in the field. His innovations continue to influence the development of advanced semiconductor devices.