Chang-Ching Yeh

Title: Innovations of Chang-Ching Yeh

Introduction

Chang-Ching Yeh is a prominent inventor based in Taipei, Taiwan. He has made significant contributions to the field of integrated circuit technology. With a total of 2 patents, his work focuses on advanced fabrication methods that enhance the performance of semiconductor devices.

Latest Patents

Chang-Ching Yeh's latest patents include innovative methods for integrated circuit structures and their fabrication. One patent describes a method that involves forming a fin structure over a substrate, creating a gate structure that crosses the fin structure, and incorporating a gate electrode along with a hard mask layer. This method also details the formation of gate spacers and an ion implantation process to create doped regions. The process culminates in etching portions of the fin structure to form recesses and the formation of source/drain epitaxial structures within those recesses. Another patent outlines a similar approach, where dummy gate structures are used to extend across the fin structure, followed by an ion implantation process and the formation of an epitaxial structure in the recess created in the source/drain region.

Career Highlights

Chang-Ching Yeh is currently employed at Taiwan Semiconductor Manufacturing Company Limited, a leading firm in the semiconductor industry. His work at this company has allowed him to push the boundaries of integrated circuit design and fabrication.

Collaborations

Chang-Ching Yeh collaborates with Yu-Hsien Lin, a fellow innovator in the field. Their partnership has contributed to the advancement of semiconductor technologies.

Conclusion

Chang-Ching Yeh's contributions to integrated circuit technology through his patents and work at Taiwan Semiconductor Manufacturing Company Limited highlight his role as a key innovator in the semiconductor industry. His advancements continue to shape the future of electronic devices.