Suwon, South Korea

Chan Un Jeon

This inventor holds 1 USPTO granted patent. Top assignee: K. C. Tech Co., Ltd.. Active years: 2019.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Chan Un Jeon. Retrieved from https://idiyas.com/inventor/chan-un-jeon

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 7.0

ph-index = 1


Company Filing History:


Years Active: 2019

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1 patent (USPTO):Explore Patents

Title: Innovations by Chan Un Jeon in Semiconductor Technology

Introduction

Chan Un Jeon is a notable inventor based in Suwon, South Korea. He has made significant contributions to the field of semiconductor technology, particularly in the area of slurry compositions used in chemical mechanical polishing (CMP) processes. His innovative approach addresses critical challenges faced in semiconductor manufacturing.

Latest Patents

Chan Un Jeon holds a patent for a "Method for preparing slurry composition and slurry composition prepared thereby." This invention focuses on a method that reduces scratches and residual particles, which are major factors affecting yield due to macroparticles and aggregated particles. The slurry composition he developed maintains a high polishing rate, which is essential in semiconductor CMP processes. Furthermore, it achieves excellent results in ultra-large scale integration semiconductor processes, addressing wafer non-uniformity and minimizing micro-scratches.

Career Highlights

Chan Un Jeon is associated with K. C. Tech Co., Ltd., where he continues to innovate in the semiconductor field. His work has been instrumental in enhancing the efficiency and effectiveness of semiconductor manufacturing processes.

Collaborations

Chan has collaborated with talented coworkers, including Jang Kuk Kwon and Bo Hyeok Choi, who contribute to the advancements in their projects.

Conclusion

Chan Un Jeon's contributions to semiconductor technology through his innovative patent demonstrate his commitment to improving manufacturing processes. His work not only addresses existing challenges but also paves the way for future advancements in the industry.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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