Company Filing History:
Years Active: 2022
Title: Innovations of Chai Jin Chua: A Pioneer in Substrate Processing Technology
Introduction: Chai Jin Chua is an accomplished inventor based in Singapore, known for his significant contributions to substrate processing technology. With a focus on enhancing the efficiency and effectiveness of substrate processing methods, Chua has made strides in the field that are recognized globally.
Latest Patents: Chua holds a patent for a substrate processing method and apparatus. This innovative method involves a chamber that includes a substrate support, an upper electrode, and a gas supply port. The process consists of several steps, including providing the substrate on the support, supplying a first processing gas, and generating plasma through a combination of RF and negative DC voltage signals. The method is designed to optimize the processing time, with each cycle taking 30 seconds or less.
Career Highlights: Chai Jin Chua is currently associated with Tokyo Electron Limited, a leading company in the semiconductor manufacturing equipment industry. His work at Tokyo Electron Limited has allowed him to apply his innovative ideas in a practical setting, contributing to advancements in substrate processing technologies.
Collaborations: Chua has collaborated with notable colleagues in his field, including Seiichi Watanabe and Kazuki Narishige. These collaborations have fostered an environment of innovation and have led to the development of cutting-edge technologies in substrate processing.
Conclusion: Chai Jin Chua's contributions to substrate processing technology exemplify the impact of innovation in the semiconductor industry. His patent and work at Tokyo Electron Limited highlight his role as a key figure in advancing substrate processing methods.