This inventor holds 1 USPTO granted patent. Top assignee: Intel Corporation. Active years: 1999.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 1999
Title: The Innovative Contributions of Chai-Hong Jan in Semiconductor Technology
Introduction
Chai-Hong Jan is an accomplished inventor based in Portland, Oregon, known for his significant contributions to the field of semiconductor technology. With a keen focus on innovation, Jan has developed a unique patent that enhances the efficiency of dopant implantation in silicon substrates.
Latest Patents
Jan holds one patent titled "Two step source/drain anneal to prevent dopant evaporation." This innovative process involves a two-step annealing method that allows dopants to be ion implanted directly into silicon without the need for a protective oxide layer. The first step of this annealing process enables a thin oxide to form over the source and drain regions at a controlled low temperature (approximately 600 degrees Celsius), effectively preventing the evaporation of dopants from both the silicon substrate and the polysilicon gate. In the second step, the temperature is increased, facilitating the driving of the dopants into the substrate to create the source and drain regions.
Career Highlights
Chai-Hong Jan's career includes significant tenure at Intel Corporation, where his inventive work plays a crucial role in advancing semiconductor fabrication processes. His invention, which streamlines the dopant implantation process, is a testament to his dedication to improving electronic performance and efficiency in silicon-based technologies.
Collaborations
Jan has collaborated with renowned professionals in the industry, including his coworker Scott E. Thompson. Together, they have contributed to the research and development necessary to drive innovation within the semiconductor sector.
Conclusion
Through his groundbreaking patent and collaborative efforts at Intel Corporation, Chai-Hong Jan exemplifies the spirit of innovation that is essential in the ever-evolving landscape of technology. His work not only enhances manufacturing efficiency but also champions advancements in semiconductor technology, paving the way for future innovations.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile