Ventura, CA, United States of America

Chad W Fulk


 

Average Co-Inventor Count = 4.1

ph-index = 1

Forward Citations = 2(Granted Patents)


Location History:

  • Ventura, CA (US) (2017 - 2019)
  • Santa Barbara, CA (US) (2023 - 2024)

Company Filing History:


Years Active: 2017-2024

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4 patents (USPTO):Explore Patents

Title: Chad W Fulk: Innovator in Electrical Device Technology

Introduction

Chad W Fulk is a notable inventor based in Ventura, CA, who has made significant contributions to the field of electrical devices. With a total of 4 patents to his name, Fulk's work focuses on innovative solutions that enhance the functionality and efficiency of electrical systems.

Latest Patents

Fulk's latest patents include groundbreaking technologies such as the Hybrid pocket post and tailored via dielectric for 3D-integrated electrical devices. This invention features a substrate and an insulating layer that supports an electrically conductive vertical interconnect. The design aims to manage thermal expansion effectively, ensuring the reliability of the device under varying temperatures. Another notable patent involves a method for fabricating electrical contacts between p-type mercury cadmium telluride and a metal layer, which enhances the performance of electrical paths in advanced devices.

Career Highlights

Chad W Fulk is currently employed at Raytheon Company, where he applies his expertise in electrical engineering to develop cutting-edge technologies. His work has been instrumental in advancing the capabilities of electrical devices, making them more efficient and reliable.

Collaborations

Fulk has collaborated with esteemed colleagues such as Andrew Peter Clarke and Jay R Neumann, contributing to a dynamic work environment that fosters innovation and creativity.

Conclusion

Chad W Fulk's contributions to electrical device technology through his patents and collaborations highlight his role as a leading inventor in the field. His innovative approaches continue to shape the future of electrical engineering.

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