Company Filing History:
Years Active: 1999-2001
Title: Chad Goudie: Innovator in Semiconductor Processing Technologies
Introduction
Chad Goudie is a notable inventor based in Chandler, AZ (US), recognized for his contributions to semiconductor processing technologies. He holds a total of 3 patents, showcasing his innovative approach to improving workpiece surface cleaning and monitoring during processing.
Latest Patents
Goudie's latest patents include an "Apparatus for cleaning workpiece surfaces and monitoring probes during workpiece processing." This invention provides methods and apparatus that allow for in-process, in-situ, and substantially real-time measurement of the actual thickness of a surface layer of a workpiece, such as a semiconductor wafer. The design features a probe positioned near the outer perimeter of a polishing pad on a Chemical Mechanical Planarization (CMP) table, establishing optical contact with the wafer surface. The reflected signal received by the probe is analyzed to calculate the thickness of the surface layer. Additionally, the invention includes a nozzle assembly with multiple fluid outlets to apply streams of deionized water and nitrogen gas, effectively cleaning the probe tip and removing debris during endpoint detection cycles.
Career Highlights
Throughout his career, Chad Goudie has worked with reputable companies, including Speedfam-IPEC Corporation and Speedfam Corporation. His experience in these organizations has contributed significantly to his expertise in semiconductor technologies and innovations.
Collaborations
Some of Goudie's notable coworkers include John Natalicio and Paul L Holzapfel, who have collaborated with him on various projects in the semiconductor field.
Conclusion
Chad Goudie's innovative work in semiconductor processing has led to significant advancements in the industry. His patents reflect a commitment to enhancing the efficiency and effectiveness of workpiece surface cleaning and monitoring technologies.