San Jose, CA, United States of America

Catherine B Labelle

This inventor holds 3 USPTO granted patents. Top assignee: Advanced Micro Devices Corporation. Active years: 2004-2006.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Catherine B Labelle. Retrieved from https://idiyas.com/inventor/catherine-b-labelle-zi8lqal8

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 33.3

Average Co-Inventor Count = 3.8

ph-index = 1

Forward Citations = 5(Granted Patents)


Company Filing History:


Years Active: 2004-2006

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3 patents (USPTO):Explore Patents

Title: The Innovative Contributions of Catherine B. Labelle

Introduction

Catherine B. Labelle is a prominent inventor based in San Jose, California. She has made significant contributions to the field of semiconductor technology, holding a total of 3 patents. Her work focuses on improving processes in the fabrication of semiconductor devices, which are crucial for modern electronics.

Latest Patents

Catherine's latest patents include innovative systems and methods that enhance the monitoring and control of etch processes in semiconductor manufacturing. One of her notable patents is titled "Scatterometry with grating to observe resist removal rate during etch." This invention discloses a system that monitors a patterned photoresist clad-wafer structure during the etch process. The system includes a semiconductor wafer structure with a substrate and a patterned photoresist layer, along with a monitoring system that collects data as the etch progresses. This technology aims to optimize the wafer clean process by making necessary adjustments based on real-time data.

Another significant patent is "Situ monitoring of microloading using scatterometry with variable pitch gratings." This invention addresses the microloading effect in semiconductor fabrication, allowing for the formation of features with varying densities on the same layer using a single photomask. The system includes a microloading characterization system that monitors the fabrication process and measures feature depth, enabling precise control over the manufacturing parameters.

Career Highlights

Catherine B. Labelle is currently employed at Advanced Micro Devices Corporation, a leading company in the semiconductor industry. Her work at AMD has positioned her as a key player in advancing semiconductor technologies.

Collaborations

Throughout her career, Catherine has collaborated with talented individuals such as Bhanwar Singh and Ramkumar Subramanian. These collaborations have contributed to her innovative work and the successful development of her patents.

Conclusion

Catherine B. Labelle's contributions to semiconductor technology through her patents demonstrate her expertise and commitment to innovation. Her work continues to influence the industry and pave the way for future advancements in semiconductor manufacturing.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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