Carl Christoph Stahr

Title: Carl Christoph Stahr: Innovator in Sputtering Technology

Introduction

Carl Christoph Stahr is a notable inventor based in Alzenau, Germany. He has made significant contributions to the field of sputtering technology, particularly in the development of advanced materials for various applications. With a total of 2 patents, Stahr's work focuses on enhancing the performance characteristics of sputtering targets.

Latest Patents

Stahr's latest patents include a "Metal oxide target and method for producing said metal oxide target." This invention describes a sputtering target designed for the production of layers, such as optical layers. The target comprises a combination of silicon or a mixture of silicon and aluminum, along with metal oxides. The metal oxide fraction is generated by the combination of these materials, which may include various metal oxides like ZrO, TaO, YO, HfO, CaO, MgO, CeO, AlO, TiO, and NbO. Another significant patent is the "Sputtering target with optimized performance characteristics," which involves a sputtering material containing zirconium and titanium, along with at least one mixed oxide phase.

Career Highlights

Stahr is currently associated with Materion Advanced Materials Germany GmbH, where he continues to innovate in the field of advanced materials. His work has been instrumental in improving the efficiency and effectiveness of sputtering processes.

Collaborations

Stahr collaborates with talented individuals such as Christoph Simons and Jens Wagner, contributing to a dynamic team focused on advancing sputtering technology.

Conclusion

Carl Christoph Stahr's contributions to sputtering technology and advanced materials have positioned him as a key figure in his field. His innovative patents reflect a commitment to enhancing material performance and production methods.