Materion Advanced Materials Germany Gmbh

Carl Christoph Stahr

Martin Schlott

Christoph Simons

Jens Wagner

Josef Heindel

A sputtering target for the production of layers such as optical layers, the layers produced by the target, and a method for producing the target are described. In addition to Si or a combination of Si and Al, the sputtering target contains metal oxide(s), a combination of at least two metal oxides, or a combination containing at least one metal oxide in the form of an alloy or in the form of a mixture. The sputtering target has a metal oxide fraction generated by the Si and Al and the metal oxide(s) or the combination thereof. Preferably, the metal oxide in the sputtering target is a metal oxide selected from ZrO, TaO, YO, HfO, CaO, MgO, CeO, AlO, TiOand NbO.

Metal oxide target and method for producing said metal oxide target

The invention relates to a sputtering target containing a sputtering material containing a metal oxide. The sputtering material contains zirconium and titanium as metals and contains at least one mixed oxide phase.

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Alzenau, Germany

Carl Christoph Stahr