Calvin Wu

Title: The Innovations of Calvin Wu

Introduction

Calvin Wu is a notable inventor based in Hsinchu, Taiwan. He has made significant contributions to the field of semiconductor technology, holding two patents that showcase his innovative spirit and technical expertise.

Latest Patents

One of his latest patents is titled "Mask pattern for defining a floating gate region." This invention involves a mask pattern that includes a first region, which is strip-shaped with two long sides and two short sides, along with two second regions that are also strip-shaped. The second regions extend lengthwise from the short sides of the first region and are used to define a floating gate region in flash memory. Another patent is the "Method for fabricating poly-spacers." This method outlines the process of creating poly-spacers on a semiconductor substrate, which includes forming an undoped first polysilicon layer, performing ion implantations, and etching to create spacers.

Career Highlights

Calvin Wu has worked with prominent companies in the semiconductor industry, including TSMC (Taiwan Semiconductor Manufacturing Company) and Acer Semiconductor Manufacturing Corporation. His experience in these organizations has allowed him to refine his skills and contribute to groundbreaking advancements in technology.

Collaborations

Throughout his career, Calvin has collaborated with talented individuals such as Shiou-han Liaw and Yau-feng Lo. These partnerships have fostered an environment of innovation and creativity, leading to the development of impactful technologies.

Conclusion

Calvin Wu's contributions to the semiconductor field through his patents and collaborations highlight his role as a significant inventor. His work continues to influence advancements in technology and showcases the importance of innovation in the industry.