C H Wu

Title: C H Wu: Innovator in Semiconductor Technology

Introduction

C H Wu is a prominent inventor based in Hsiang San Keng, Hsinchu, Taiwan. He has made significant contributions to the field of semiconductor technology, holding a total of 4 patents. His work has been instrumental in advancing the design and fabrication of semiconductor devices.

Latest Patents

One of C H Wu's latest patents focuses on sidewall spacers for self-aligned contacts. This patent presents a semiconductor device and a method for fabricating such a device. The semiconductor device includes a first gate electrode of a transistor, a first sidewall spacer along a sidewall of the gate pattern, and a first insulating layer in contact with the first sidewall spacer, which has a planarized top surface. Additionally, a second sidewall spacer is formed on the planarized top surface of the first insulating layer. Notably, the width of the second sidewall spacer is equal to or greater than that of the first sidewall spacer.

Career Highlights

Throughout his career, C H Wu has worked with notable companies, including Taiwan Semiconductor Manufacturing Company Limited. His expertise in semiconductor technology has allowed him to contribute to various innovative projects and advancements in the industry.

Collaborations

C H Wu has collaborated with several talented individuals in his field, including Min-Yann Hsieh and Hua Feng Chen. These collaborations have further enriched his work and contributed to the success of his projects.

Conclusion

C H Wu is a distinguished inventor whose work in semiconductor technology has led to significant advancements in the field. His patents and collaborations reflect his commitment to innovation and excellence in technology.