Company Filing History:
Years Active: 2004-2008
Title: C Andre T Salama: Innovator in Semiconductor Technology
Introduction
C Andre T Salama is a prominent inventor based in Toronto, Canada. He has made significant contributions to the field of semiconductor technology, holding a total of 6 patents. His work focuses on innovative methods for manufacturing semiconductor integrated circuit devices.
Latest Patents
One of his latest patents is a method of manufacturing a semiconductor integrated circuit (IC) device that integrates a trench lateral power MOSFET (TLPM) and one or more planar semiconductor devices on a semiconductor substrate. This method involves several intricate steps, including trench etching to form a trench, creating a p-type body region, and an n-type expanded drain region. The process also includes forming gate oxide films and gate electrodes for the TLPM, NMOSFET, and PMOSFET. Additionally, it encompasses the formation of p-type base regions for the TLPM and an NPN bipolar transistor, as well as n-type source and drain regions. The method concludes with the formation of an interlayer oxide film, a contact electrode, and constituent metal electrodes.
Career Highlights
C Andre T Salama is currently employed at Fuji Electric Co., Ltd., where he continues to advance semiconductor technology. His expertise in manufacturing processes has positioned him as a key player in the industry.
Collaborations
Throughout his career, Salama has collaborated with notable professionals, including Naoto Fujishima and Akio Sugi. These collaborations have further enriched his contributions to the field.
Conclusion
C Andre T Salama's innovative work in semiconductor technology and his impressive portfolio of patents highlight his significant impact on the industry. His ongoing contributions continue to shape the future of integrated circuit manufacturing.