Byoung Youp Kim

Title: Byoung Youp Kim: Innovator in Semiconductor Technology

Introduction

Byoung Youp Kim is a prominent inventor based in Schenectady, NY (US). He has made significant contributions to the field of semiconductor technology, holding a total of 6 patents. His work focuses on innovative methods and structures that enhance the manufacturing processes in integrated circuits.

Latest Patents

One of his latest patents is titled "Variable space mandrel cut for self-aligned double patterning." This patent relates to semiconductor structures and outlines a method that includes forming a plurality of mandrels on a substrate, creating spacers around these mandrels, and filling openings with material. Another notable patent is "Method of forming a pattern for interconnection lines and associated continuity blocks in an integrated circuit." This method involves providing a structure with a mandrel layer and etch mask layer, followed by selective etching to create patterns in the integrated circuit.

Career Highlights

Throughout his career, Byoung Youp Kim has worked with leading companies in the semiconductor industry, including GlobalFoundries Inc. and STMicroelectronics GmbH. His expertise in semiconductor manufacturing processes has positioned him as a valuable asset in these organizations.

Collaborations

He has collaborated with notable professionals in the field, including Guillaume Bouche and Jason Eugene Stephens. These collaborations have further enriched his work and contributed to advancements in semiconductor technology.

Conclusion

Byoung Youp Kim's innovative contributions to semiconductor technology and his impressive portfolio of patents highlight his role as a key figure in the industry. His work continues to influence the development of advanced manufacturing techniques in integrated circuits.