The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 09, 2017

Filed:

Apr. 05, 2016
Applicants:

International Business Machines Corporation, Armonk, NY (US);

Stmicroelectronics, Inc., Coppell, TX (US);

Inventors:

John H. Zhang, Altamont, NY (US);

Lawrence A. Clevenger, LaGrangeville, NY (US);

Carl Radens, LaGrangeville, NY (US);

Yiheng Xu, Hopewell Junction, NY (US);

Byoung Youp Kim, Schenectady, NY (US);

Walter Kleemeier, Albany, NY (US);

Assignees:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/4763 (2006.01); H01L 23/00 (2006.01); H01L 21/768 (2006.01); H01L 21/66 (2006.01); H01L 23/528 (2006.01); H01L 23/532 (2006.01); H01L 23/522 (2006.01);
U.S. Cl.
CPC ...
H01L 23/562 (2013.01); H01L 21/76805 (2013.01); H01L 21/76843 (2013.01); H01L 21/76897 (2013.01); H01L 22/12 (2013.01); H01L 22/14 (2013.01); H01L 22/32 (2013.01); H01L 23/528 (2013.01); H01L 23/5223 (2013.01); H01L 23/5227 (2013.01); H01L 23/5228 (2013.01); H01L 23/53266 (2013.01); H01L 23/5226 (2013.01); H01L 2924/0002 (2013.01);
Abstract

Various embodiments facilitate die protection for an integrated circuit. In one embodiment, a multilayer structure is formed in multiple levels and along the edges of a die to prevent and detect damages to the die. The multilayer structure includes a support layer, a first plurality of dielectric pillars overlying the support layer, a metal layer that fills spaces between the first plurality of dielectric pillars, an insulation layer overlying the first plurality of dielectric pillars and the metal layer, a second plurality of dielectric pillars overlying the insulation layer, and a second metal layer that fills spaces between the second plurality of dielectric pillars.


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