Incheon, South Korea

Byeong Geun Kim

USPTO Granted Patents = 2 

Average Co-Inventor Count = 14.4

ph-index = 1


Company Filing History:


Years Active: 2022-2024

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2 patents (USPTO):Explore Patents

Title: Innovator Byeong Geun Kim: Pioneering Substrate Treatment and Etching Technologies

Introduction

Byeong Geun Kim is a notable inventor based in Incheon, South Korea. He has been actively contributing to the field of innovative technologies, holding two patents that showcase his expertise. His work is particularly focused on methods and apparatuses for treating substrates and etching thin layers.

Latest Patents

Byeong Geun Kim's latest patents include:

1. **Method and apparatus for treating substrate** - This inventive concept introduces a substrate treating method that encompasses a treatment process utilizing a first fluid in a supercritical state and a second fluid in a supercritical state, both differing in density. The method is designed to effectively treat residues on substrates within a specialized chamber.

2. **Method and apparatus for etching thin layer** - This patent outlines a technique for etching a thin layer, such as silicon nitride, on a substrate. The etching process involves supplying an etchant composed of phosphoric acid and water, forming a liquid layer on the substrate. The invention includes methods for measuring the thickness of this liquid layer and adjusting the concentrations of the etchant based on real-time measurements.

Career Highlights

Byeong Geun Kim is currently employed at Semes Co., Ltd., where he plays a crucial role in advancing technology related to substrate treatment and etching processes. His innovative contributions have positioned him as a valuable asset within the company.

Collaborations

Throughout his career, Byeong Geun Kim has collaborated with talented colleagues, including Hyun Yoon and Pil Kyun Heo. These partnerships have facilitated the development of groundbreaking technologies in the field of substrate processing.

Conclusion

Byeong Geun Kim's contributions to the invention of substrate treatment and etching methodologies highlight his importance in the realm of technological innovation. Through his patents and collaborations, he continues to influence the industry, making significant strides in the effectiveness and efficiency of substrate-related processes. His commitment to innovation is commendable, and his work at Semes Co., Ltd. has undoubtedly paved the way for future advancements.

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