The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 23, 2024
Filed:
Oct. 14, 2022
Semes Co., Ltd., Cheonan-si, KR;
Yong-Jun Seo, Hwaseong-si, KR;
Hyun Yoon, Hwaseong-si, KR;
Jungsuk Goh, Hwaseong-si, KR;
Byeong Geun Kim, Incheon, KR;
Yoonki Sa, Seoul, KR;
Doyeon Kim, Yongin-si, KR;
Yerim Yeon, Hwaseong-si, KR;
Choonghyun Lee, Hwaseong-si, KR;
Pil Kyun Heo, Hwaseong-si, KR;
Youngje Um, Busan, KR;
Jaeseong Lee, Hwaseong-si, KR;
Dongok Ahn, Anyang-si, KR;
SEMES CO., LTD., Chungcheongnam-Do, KR;
Abstract
The inventive concept provides a method for treating a substrate. In an embodiment, the substrate treating method includes a treatment step of treating a residue on the substrate with a first fluid in a supercritical state and a second fluid in a supercritical state in a process space of a chamber, and the first fluid in the supercritical state and the second fluid in the supercritical state have different densities.