Burn-J Lin

Title: Innovations of Burn-J Lin in Lithography Technology

Introduction

Burn-J Lin is a notable inventor based in Hsinchu, Taiwan. He has made significant contributions to the field of lithography, particularly in the area of multi-focus scanning technology. His innovative approach has implications for the semiconductor manufacturing industry.

Latest Patents

Burn-J Lin holds a patent for a method titled "Multi-focus scanning with a tilted mask or wafer." This invention involves implementing discrete superpositioning of two or more defocal wafer images at different defocal positions in a lithographic step and scan projection system. The method includes tilting one of a mask and a wafer with respect to a scanning direction and splitting an illumination beam into at least two illumination areas that are in different defocus zones of the mask. This patent showcases his expertise in enhancing lithographic processes.

Career Highlights

Burn-J Lin is currently employed at Taiwan Semiconductor Manufacturing Company Limited, a leading player in the semiconductor industry. His work at this prestigious company allows him to apply his innovative ideas in a practical setting, contributing to advancements in technology.

Collaborations

He has collaborated with notable colleagues such as Tsai-Sheng Gau and Chia-Hui Lin. These partnerships have likely fostered an environment of innovation and creativity, further enhancing the impact of their collective work.

Conclusion

Burn-J Lin's contributions to lithography technology through his patent and work at Taiwan Semiconductor Manufacturing Company Limited highlight his role as an influential inventor in the semiconductor field. His innovative methods continue to shape the future of lithographic processes.