The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 23, 2010
Filed:
Feb. 23, 2005
Burn-j. Lin, Hsin-Chu, TW;
Chun-kuang Chen, Hsin-Chu, TW;
Tsai-sheng Gau, Hsin Chu, TW;
Chia-hui Lin, Hsin-Chu, TW;
Ru-gun Liu, Yungkang, TW;
Jen-chieh Shih, Yongkang, TW;
Burn-J. Lin, Hsin-Chu, TW;
Chun-Kuang Chen, Hsin-Chu, TW;
Tsai-Sheng Gau, Hsin Chu, TW;
Chia-Hui Lin, Hsin-Chu, TW;
Ru-Gun Liu, Yungkang, TW;
Jen-Chieh Shih, Yongkang, TW;
Taiwan Semiconductor Manufacturing Co., Ltd., Hsin-Chu, TW;
Abstract
A method for implementing discrete superpositioning of two or more defocal wafer images at different defocal positions in a lithographic step and scan projection system. The method includes tilting one of a mask and a wafer with respect to a scanning direction and splitting an illumination beam into at least two illumination areas which are in different defocus zones of the mask.