Company Filing History:
Years Active: 2008
Title: The Innovative Contributions of Bunji Uchiyama
Introduction
Bunji Uchiyama, an accomplished inventor based in Ebina, Japan, has made significant strides in the field of pattern exposure technology. With one notable patent to his name, Uchiyama has contributed to advancements that improve efficiency and cost-effectiveness in manufacturing processes.
Latest Patents
Uchiyama's patent centers around a "Pattern Exposure Method and Pattern Exposure Apparatus." This innovative invention is designed to enhance throughput using an inexpensive apparatus and aims to maintain low running costs. The invention involves the arrangement of output faces from multiple semiconductor lasers in two directions. One direction aligns with the scanning direction of a polygon mirror while the other crosses this scanning direction. By ensuring that the array pitch of the output faces matches the resolution of the exposure pattern, and keeping the laser wavelengths at or below 410 nm, Uchiyama’s invention marks a significant step forward in the field.
Career Highlights
Uchiyama is affiliated with Hitachi Via Mechanics Ltd., a company known for its contributions to the technology sector. His role there allows him to collaborate with some of the brightest minds in the industry, driving forward the company's innovative goals.
Collaborations
Throughout his career, Bunji Uchiyama has worked alongside talented coworkers such as Yoshitada Oshida and Yoshitatsu Naito. Their collective expertise and insights have undoubtedly contributed to the success of Uchiyama's innovations, fostering an environment of creativity and progress.
Conclusion
Bunji Uchiyama's contributions to the realm of pattern exposure technology demonstrate the impactful role of inventors in advancing industrial applications. His patents not only highlight his ingenuity but also reflect the collaborative spirit within the tech community, epitomizing the continual pursuit of innovation. As he continues to work at Hitachi Via Mechanics Ltd., the potential for further advancements remains promising.