Hitachi Via Mechanics Ltd.

Bunji Uchiyama

Yoshitatsu Naito

Yoshitada Oshida

Tsuyoshi Yamaguchi

Mituhiro Suzuki

A pattern exposure method and a pattern exposure apparatus in which the throughput is improved with an inexpensive apparatus and without a low running cost. Output faces of a plurality of laser beams emitted from a plurality of semiconductor lasers respectively are arranged in two directions. One of the directions is the same direction as the scanning direction of a polygon mirror while the other is a direction crossing the scanning direction of the polygon mirror. In this event, the array pitch of the output faces arranged in the direction crossing the scanning direction of the polygon mirror is made equal to resolution of an exposure pattern. In this event, the wavelength of each laser may be made not longer than 410 nm.

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Ebina, Japan

Bunji Uchiyama