The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 13, 2008
Filed:
Mar. 09, 2005
Yoshitada Oshida, Ebina, JP;
Yoshitatsu Naito, Ebina, JP;
Mituhiro Suzuki, Ebina, JP;
Bunji Uchiyama, Ebina, JP;
Tsuyoshi Yamaguchi, Ebina, JP;
Yoshitada Oshida, Ebina, JP;
Yoshitatsu Naito, Ebina, JP;
Mituhiro Suzuki, Ebina, JP;
Bunji Uchiyama, Ebina, JP;
Tsuyoshi Yamaguchi, Ebina, JP;
Hitachi Via Mechanics, Ltd., Ebina-shi, JP;
Abstract
A pattern exposure method and a pattern exposure apparatus in which the throughput is improved with an inexpensive apparatus and without a low running cost. Output faces of a plurality of laser beams emitted from a plurality of semiconductor lasers respectively are arranged in two directions. One of the directions is the same direction as the scanning direction of a polygon mirror while the other is a direction crossing the scanning direction of the polygon mirror. In this event, the array pitch of the output faces arranged in the direction crossing the scanning direction of the polygon mirror is made equal to resolution of an exposure pattern. In this event, the wavelength of each laser may be made not longer than 410 nm.