Bryan Larson Danforth

Title: Bryan Larson Danforth: Innovator in Thin Film Technology

Introduction

Bryan Larson Danforth is a notable inventor based in Portland, OR (US). He has made significant contributions to the field of thin film technology, holding 2 patents that showcase his innovative approaches.

Latest Patents

One of his latest patents is titled "Mixed metal-silicon-oxide barriers." This patent discloses a method of forming a thin barrier film of a mixed metal-silicon-oxide. The method involves exposing a substrate to sequences of a non-hydroxylated silicon-containing precursor, activated oxygen species, and metal-containing precursor until a mixed metal-silicon-oxide film, with a thickness of 500 angstroms or less, is formed on the substrate. Another significant patent is "Electrically- and chemically-active adlayers for plasma electrodes." This patent describes a system for forming a thin film on a substrate using a plasma to activate at least one gaseous precursor in a plasma generator that is fluidly coupled with a reaction space.

Career Highlights

Throughout his career, Bryan has worked with various companies, including Lotus Applied Technology, LLC and Toppan Printing Co., Ltd. His work has focused on advancing technologies that enhance the performance and efficiency of thin films in various applications.

Collaborations

Bryan has collaborated with notable professionals in his field, including Eric R Dickey and Masato Kon. These collaborations have contributed to the development of innovative solutions in thin film technology.

Conclusion

Bryan Larson Danforth is a distinguished inventor whose work in thin film technology has led to valuable patents and collaborations. His contributions continue to influence advancements in the field.