The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 15, 2015

Filed:

Mar. 05, 2014
Applicants:

Eric R. Dickey, Portland, OR (US);

Bryan Larson Danforth, Portland, OR (US);

Masato Kon, Sugito-cho, JP;

Inventors:

Eric R. Dickey, Portland, OR (US);

Bryan Larson Danforth, Portland, OR (US);

Masato Kon, Sugito-cho, JP;

Assignee:

LOTUS APPLIED TECHNOLOGY, LLC, Hillsboro, OR (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H05H 1/00 (2006.01); C23C 16/00 (2006.01); H01L 21/44 (2006.01); C23C 16/455 (2006.01); C23C 16/50 (2006.01); H01J 37/32 (2006.01);
U.S. Cl.
CPC ...
C23C 16/45544 (2013.01); C23C 16/50 (2013.01); H01J 37/32009 (2013.01);
Abstract

A system for forming a thin film on a substrate uses a plasma to activate at least one gaseous precursor in a plasma generator fluidly coupled with a reaction space. The plasma generator is operative to generate a plasma from at least a portion of the precursor gas with at least one pair of plasma electrodes, one plasma electrode having a non-native electrically conductive adlayer exhibiting property characteristics that cause the adlayer to be substantially conserved and chemically active with at least one of the gases present within the plasma generation region.


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