Haveriee, Belgium

Bruno Roland


Average Co-Inventor Count = 5.0

ph-index = 2

Forward Citations = 32(Granted Patents)


Location History:

  • Haveriee, BE (1990)
  • Waverse Baan, BE (1990)

Company Filing History:


Years Active: 1990

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2 patents (USPTO):Explore Patents

Title: The Innovations of Bruno Roland

Introduction

Bruno Roland is a notable inventor based in Haveriee, Belgium. He has made significant contributions to the field of radiation-sensitive materials, holding a total of 2 patents. His work focuses on enhancing the precision and efficiency of chemical processes through innovative resin compositions.

Latest Patents

One of his latest patents is a radiation-sensitive resin composition with admixtures of O-quinone. This composition comprises a quinonediazide-type radiation-sensitive resin and a compound that generates an acid upon irradiation. The resin is designed for use as a resist suitable for dry development by plasma etching, enabling the production of etching images with high precision, reproducibility, and resolution. Another significant patent is a method for high-temperature reaction processes. This method involves mounting a substrate with a radiation-sensitive polymer film on a lower heating plate within a sealed reaction vessel. The process maintains a temperature difference between the lower and upper heating plates while supplying a reactive compound into the vessel.

Career Highlights

Bruno Roland has worked with prominent companies in the industry, including Japan Synthetic Rubber Co., Ltd. and UCB Société Anonyme. His experience in these organizations has contributed to his expertise in developing advanced materials and processes.

Collaborations

Throughout his career, Bruno has collaborated with notable professionals such as Mitsunobu Koshiba and Yoshiyuki Harita. These collaborations have further enriched his work and expanded the impact of his inventions.

Conclusion

Bruno Roland's contributions to the field of radiation-sensitive materials demonstrate his innovative spirit and commitment to advancing technology. His patents reflect a deep understanding of chemical processes and a dedication to improving precision in industrial applications.

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