The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 18, 1990
Filed:
Nov. 16, 1989
Applicant:
Inventors:
Mitsunobu Koshiba, Shinyoshida, JP;
Yoshiyuki Harita, Shirahatadai, JP;
Yuuji Furuto, Nittamae, JP;
Bruno Roland, Waverse Baan, BE;
Ria Lombaerts, Kapellelei, BE;
Assignees:
Japan Synthetic Rubber Co., Ltd., Tokyo, JP;
UCB Societe Anonyme, Brussels, BE;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B44C / ; C03C / ; C03C / ; B29C / ;
U.S. Cl.
CPC ...
156628 ; 156643 ; 156646 ; 156655 ; 156668 ; 156345 ; 20419236 ;
Abstract
A method for high temperature reaction process, including the steps of mounting a substrate on which a radiation-sensitive polymer film is formed on a lower heating plate in a reaction vessel, sealing the reaction vessel while positioning an upper heating plate to above the substrate, maintaining a temperature difference between temperatures of the lower heating plate and the upper heating plate within a predetermined range, and supplying a reactive compound into the reaction vessel.