Location History:
- Kanagawa, JP (1989)
- Nittamae, JP (1990)
Company Filing History:
2 out of 377 
1 out of 52 
Years Active: 1989-1990
Title: Yuuji Furuto: Innovator in High Temperature Reaction Processes and Reactive Ion Etching
Introduction
Yuuji Furuto is a notable inventor based in Nittamae, Japan. He has made significant contributions to the fields of high temperature reaction processes and semiconductor manufacturing. With a total of 2 patents, his work has had a considerable impact on technology and innovation.
Latest Patents
Furuto's latest patents include a "Method for High Temperature Reaction Process" and a "Reactive Ion Etching Apparatus." The method for high temperature reaction process involves several steps, including mounting a substrate with a radiation-sensitive polymer film on a lower heating plate within a sealed reaction vessel. This process maintains a temperature difference between the lower and upper heating plates while supplying a reactive compound into the vessel. The reactive ion etching apparatus is designed for the manufacturing of semiconductor elements such as integrated circuits (ICs) and large-scale integrations (LSIs). It features a chucking device on a negative electrode and generates a magnetic field parallel to the surface of the material being etched, while cooling the negative electrode to a temperature not exceeding 0 degrees Celsius.
Career Highlights
Throughout his career, Yuuji Furuto has worked with prominent companies, including Japan Synthetic Rubber Co., Ltd. and UCB Societe Anonyme. His experience in these organizations has allowed him to develop and refine his innovative techniques in the field of semiconductor manufacturing and high temperature processes.
Collaborations
Furuto has collaborated with notable individuals in his field, including Mitsunobu Koshiba and Yoshiyuki Harita. These collaborations have contributed to the advancement of technology and innovation in their respective areas of expertise.
Conclusion
Yuuji Furuto's contributions to high temperature reaction processes and reactive ion etching have established him as a significant figure in the field of innovation. His patents reflect his dedication to advancing technology and improving manufacturing processes.