The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 16, 1990
Filed:
Feb. 15, 1989
Applicant:
Inventors:
Mitsunobu Koshiba, Yokohama, JP;
Keiichi Yamada, Yokohama, JP;
Yoshiyuki Harita, Kawasaki, JP;
Bruno Roland, Haveriee, BE;
Jan Vandendriesshe, Haasrode, BE;
Assignees:
Japan Synthetic Rubber Co., Ltd., Tokyo, JP;
UCB Societe Anonyme, Brussels, BE;
Primary Examiner:
Int. Cl.
CPC ...
G03F / ; G03C / ;
U.S. Cl.
CPC ...
430191 ; 430165 ; 430192 ; 430270 ; 430190 ; 430325 ;
Abstract
A radiation-sensitive resin composition comprising a quinonediazide-type radiation-sensitive resin and a compound generating an acid upon irradiation. Said radiation-sensitive resin composition can be used as a resist suitable for dry development by plasma etching and enables one to obtain an etching image having high precision with high reproducibility at a high degree of resolution and selectivity.