Jan Vandendriesshe

Title: Jan Vandendriesshe: Innovator in Radiation-Sensitive Resin Technology

Introduction

Jan Vandendriesshe is a notable inventor based in Haasrode, Belgium. He has made significant contributions to the field of radiation-sensitive resin compositions. His work has implications for high-precision etching processes, which are essential in various technological applications.

Latest Patents

Jan Vandendriesshe holds a patent for a radiation-sensitive resin composition with admixtures of O-quinone. This innovative composition comprises a quinonediazide-type radiation-sensitive resin and a compound that generates an acid upon irradiation. The resin composition is particularly suitable for dry development by plasma etching. It enables the production of etching images with high precision, reproducibility, and a high degree of resolution and selectivity. He has 1 patent to his name.

Career Highlights

Throughout his career, Jan Vandendriesshe has worked with prominent companies in the industry. He has been associated with Japan Synthetic Rubber Co., Ltd. and UCB Société Anonyme. His experience in these organizations has contributed to his expertise in developing advanced materials.

Collaborations

Jan has collaborated with notable professionals in his field, including Mitsunobu Koshiba and Keiichi Yamada. These collaborations have further enriched his work and expanded the impact of his innovations.

Conclusion

Jan Vandendriesshe is a distinguished inventor whose work in radiation-sensitive resin technology has paved the way for advancements in etching processes. His contributions continue to influence the industry and inspire future innovations.