Bruce M Stevens

Title: Bruce M Stevens: Innovator in Photoresist Technology

Introduction

Bruce M Stevens is a notable inventor based in Somerville, NJ (US). He has made significant contributions to the field of photoresist technology, particularly through his innovative patent. His work has implications for various applications in the semiconductor industry.

Latest Patents

Stevens holds a patent for "Positive photoresist processing with mid U-V range exposure." This invention provides a method for producing a positive working photoresist. The process involves coating at least one novolak resin and 1-naphthalenesulfonic acid, 3-diazo-3,4-dihydro-4-oxo-,4-benzoyl-1,2,3-benzenetriyl ester onto a substrate. The substrate is then exposed to a U.V. light source with a wavelength of less than 380 nanometers and developed with an aqueous alkaline solution. This innovative approach enhances the efficiency and effectiveness of photoresist processing.

Career Highlights

Bruce M Stevens is associated with American Hoechst Corporation, where he has contributed to advancements in photoresist technology. His work has been instrumental in improving processes that are critical to the semiconductor manufacturing industry.

Collaborations

Stevens has collaborated with notable colleagues, including Donald C Mammato and John DiCarlo. These partnerships have fostered innovation and development in their respective fields.

Conclusion

Bruce M Stevens is a distinguished inventor whose work in photoresist technology has made a lasting impact. His patent and contributions to American Hoechst Corporation highlight his role in advancing semiconductor manufacturing processes.