The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 24, 1986
Filed:
Oct. 01, 1984
Applicant:
Inventors:
John DiCarlo, Coventry, RI (US);
Jonas St Alban, Westerly, RI (US);
Donald C Mammato, Lebanon, NJ (US);
Bruce M Stevens, Somerville, NJ (US);
Assignee:
American Hoechst Corporation, Somerville, NJ (US);
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
G03F / ;
U.S. Cl.
CPC ...
430326 ; 430189 ; 430192 ; 430193 ; 430165 ; 430330 ; 534557 ;
Abstract
The invention provides a method for producing a positive working photoresist which comprises coating at least one novolak resin, and 1-naphthalenesulfonic acid, 3-diazo-3,4-dihydro-4-oxo-,4-benzoyl-1,2,3-benzenetriyl ester onto a substrate, exposing to a u.v. light source having a wavelength of less than 380 nanometers and developing with an aqueous alkaline solution.
DiCarlo, John. (1986). Positive photoresist processing with mid u-v range exposure (U.S. Patent No. 4596763). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/4596763
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile