Donald C Mammato

Title: The Innovative Contributions of Donald C. Mammato

Introduction

Donald C. Mammato is a notable inventor based in Lebanon, NJ (US), recognized for his significant contributions to the field of photoresist technology. With a total of 8 patents to his name, Mammato has made strides in developing processes that enhance the functionality and stability of photosensitive compositions.

Latest Patents

Among his latest patents, Mammato has developed an image reversal negative working photoresist containing O-quinone diazide. This innovative process converts a normally positive working photosensitive composition to a negative working composition. The method involves forming a composition that includes an alkali soluble resin, a 1,2 quinone diazide-4-sulfonyl compound, and an acid-catalyzed crosslinker in a solvent mixture. After drying and imagewise exposing, the composition is baked and developed to produce a negative image. Additionally, he has created an image reversal negative working O-naphthoquinone diazide, which follows a similar process and boasts superior storage stability and shelf life.

Career Highlights

Mammato has had a distinguished career, working with prominent companies such as Hoechst Celanese Corporation and American Hoechst Corporation. His work in these organizations has allowed him to refine his expertise in photoresist technology and contribute to advancements in the field.

Collaborations

Throughout his career, Mammato has collaborated with talented individuals, including Sangya Jain and Dana L. Durham. These partnerships have fostered innovation and have been instrumental in the development of his patented technologies.

Conclusion

Donald C. Mammato's contributions to photoresist technology and his innovative patents have significantly impacted the industry. His work continues to influence advancements in photosensitive compositions, showcasing his dedication to innovation and excellence.