This inventor holds 1 USPTO granted patent. Top assignee: International Business Machines Corporation. Active years: 2002.
Company Filing History:
Years Active: 2002
Title: Bruce A. Root: Innovator in Semiconductor Metallurgy
Introduction
Bruce A. Root is a notable inventor based in Westford, VT (US). He has made significant contributions to the field of semiconductor devices, particularly in the area of copper metallurgy. His innovative approach has led to advancements that enhance production yields in semiconductor manufacturing.
Latest Patents
Bruce A. Root holds a patent for a method of annealing copper metallurgy. This method is designed to increase the production yield of semiconductor devices that utilize copper metallurgy planarized by a chemical-mechanical planarization process. The process involves a slurry containing a conductor passivating agent, such as benzotriazole. A non-oxidizing anneal is employed to eliminate any residues that could interfere with mechanical probing of conductive lands on the substrate before further metallization steps. The anneal can be performed using various techniques, including a vacuum chamber, a standard furnace, or rapid thermal annealing.
Career Highlights
Bruce A. Root is associated with the International Business Machines Corporation (IBM), where he has applied his expertise in semiconductor technology. His work has been instrumental in developing methods that improve the efficiency and effectiveness of semiconductor production.
Collaborations
Throughout his career, Bruce has collaborated with notable colleagues, including Arne Watson Ballantine and Edward Crandal Cooney, III. These collaborations have contributed to the advancement of technology in the semiconductor industry.
Conclusion
In summary, Bruce A. Root is a distinguished inventor whose work in semiconductor metallurgy has led to innovative methods that enhance production yields. His contributions continue to impact the field positively.