International Business Machines Corporation

Bruce A Root

Anthony K Stamper

Arne Watson Ballantine

Andrew Herbert Simon

Edward Crandal Cooney, Iii

Stephen Edward Greco

Nancy Anne Greco

Ronald A Warren

Ronald Dean Goldblatt

Jeffrey D Gilbert

Glenn Robert Miller

George A Dunbar, Iii

Frank V Liucci

Cheryl Faltermeier

David H Yao

A method for increasing the production yield of semiconductor devices having copper metallurgy planarized by a chemical-mechanical planarization process which includes a slurry that contains a conductor passivating agent, like benzotriazole, wherein a non-oxidizing anneal is used to remove any residue which might interfere with mechanical probing of conductive lands on the substrate prior to further metallization steps. The anneal may be performed by any of several techniques including a vacuum chamber, a standard furnace or by rapid thermal annealing.

Method of annealing copper metallurgy

Growing community of inventors

Westford, VT, United States of America

Bruce A Root