Briant Harward

Title: Innovations by Briant Harward

Introduction

Briant Harward is a notable inventor based in West Jordan, UT (US). He has made significant contributions to the field of semiconductor technology, holding a total of 2 patents. His work focuses on innovative techniques for forming semiconductor structures, which are crucial for the advancement of electronic devices.

Latest Patents

Briant's latest patents include a "Technique for controlling trench profile in semiconductor structures." This method involves forming trenches in a semiconductor region using a masking layer, which allows for precise control over the depth, width, and slope of the trenches. The process includes removing the masking layer and performing a bevel etch to taper the sidewalls of the trenches.

Another significant patent is the "Method for forming trenches with wide upper portion and narrow lower portion." This method describes the formation of a trench by using a hard mask layer that has varying thicknesses. The technique allows for the creation of a trench with an upper portion that is wider than its lower portion, enhancing the efficiency of semiconductor structures.

Career Highlights

Briant Harward has established himself as a key figure in the semiconductor industry through his innovative work at Fairchild Semiconductor Corporation. His expertise in semiconductor technology has contributed to the development of advanced electronic components.

Collaborations

Briant has collaborated with notable coworkers such as Hui Chen and James N Pan. Their combined efforts have led to advancements in semiconductor technology and the successful implementation of innovative techniques.

Conclusion

Briant Harward's contributions to semiconductor technology through his patents and collaborations highlight his importance in the field. His innovative methods continue to influence the development of electronic devices, showcasing the impact of his work on the industry.