Company Filing History:
Years Active: 2007-2010
Title: **Brandon L Ward: Innovator in Semiconductor Device Technology**
Introduction
Brandon L Ward is a notable inventor based in San Jose, California. With a focus on advancing semiconductor technologies, he has made significant contributions to the field through his innovative inventions. Ward holds a total of two patents, both of which address critical issues in device characterization and fabrication processes.
Latest Patents
Ward's latest patents include:
1. **Device having etched feature with shrinkage carryover** - This patent describes a device that incorporates a first etched feature situated in a critical dimension scanning electron microscope (CD-SEM) characterization location. The invention emphasizes the importance of managing shrinkage in the etched features to maintain dimensional accuracy. The middle section of the first etched feature is reported to have severe shrinkage compared to a similar second etched feature that is not subjected to CD-SEM characterization.
2. **Characterizing resist line shrinkage due to CD-SEM inspection** - This patent introduces a novel technique via a CD-SEM system, aimed at characterizing and mitigating shrinkage carryover resulting from CD-SEM measurements. The system not only identifies the effects of measurements on the resist but also adjusts operating parameters appropriately. This adjustment is crucial for obtaining reliable critical dimension measurements and for protecting the integrity of the measured features.
Career Highlights
Brandon L Ward is currently employed at Intel Corporation, a renowned leader in semiconductor innovation. His work at Intel focuses on enhancing the precision of semiconductor manufacturing and characterization processes, contributing to the company's reputation for cutting-edge technology.
Collaborations
Ward collaborates with esteemed colleagues, including Gary X Cao and George K Chen. Together, they explore advanced methodologies in device characterization and aim to push the boundaries of semiconductor technology. Their collaborative efforts foster an innovative environment at Intel, ultimately benefitting the semiconductor industry.
Conclusion
Brandon L Ward's impactful patents and collaborative work at Intel Corporation highlight his commitment to innovation in the semiconductor field. As he continues to contribute to advancements in device technology, Ward's work not only enhances manufacturing processes but also sets a foundation for future innovations that will shape the industry.