The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 23, 2007
Filed:
Jul. 07, 2004
Gary X. Cao, Santa Clara, CA (US);
George Chen, Los Gatos, CA (US);
Brandon L. Ward, San Jose, CA (US);
Nancy J. Wheeler, Mountain View, CA (US);
Alan Wong, San Jose, CA (US);
Gary X. Cao, Santa Clara, CA (US);
George Chen, Los Gatos, CA (US);
Brandon L. Ward, San Jose, CA (US);
Nancy J. Wheeler, Mountain View, CA (US);
Alan Wong, San Jose, CA (US);
Intel Corporation, Santa Clara, CA (US);
Abstract
A CD-SEM (critical dimension-scanning electron microscope) system may utilize a technique for characterizing and reducing shrinkage carryover due to CD-SEM measurements. The system may identify the affects of CD-SEM measurements on the resist and adjust the operating parameters for a particular resist to avoid or significantly reduce shrinkage carryover. In this manner, the system may obtain more reliable CD measurements and avoid damage to the measured feature.