Company Filing History:
Years Active: 2024-2025
Title: Innovations by Brandon Jay Holybee
Introduction
Brandon Jay Holybee is an accomplished inventor based in Portland, Oregon. He has made significant contributions to the field of integrated circuit (IC) devices, holding three patents that showcase his innovative approach to technology.
Latest Patents
His latest patents include "Directed self-assembly enabled subtractive metal patterning," which describes processes for forming patterned metal layers in IC devices. This patent focuses on subtractive metal patterning, where portions of a metal layer are etched and replaced with an insulator to create metal gratings. The process utilizes directed self-assembly (DSA) to generate masks for etching, allowing for multiple etching steps to create metal lines at varying pitches. Another notable patent is "Directed self-assembly enabled patterning over metal layers using assisting features." This invention details the formation of patterned layers over non-uniform conductive layers using DSA assisting features, enabling the creation of complex structures in IC devices.
Career Highlights
Brandon currently works at Intel Corporation, a leading technology company known for its advancements in semiconductor manufacturing. His work at Intel has positioned him as a key player in the development of innovative IC technologies.
Collaborations
Brandon has collaborated with talented coworkers, including Xuanxuan Chen and Florian Gstrein, contributing to the advancement of their projects and innovations.
Conclusion
Brandon Jay Holybee's contributions to the field of integrated circuits through his patents and work at Intel Corporation highlight his role as a significant innovator in technology. His inventions continue to influence the development of advanced semiconductor solutions.