Company Filing History:

10 out of 12

Qoniac Gmbh

Years Active: 2010-2022

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12 patents (USPTO):Sort by Forward CitationsExplore Patents

1. 11366397 - Method and apparatus for simulation of lithography overlay (2022-06-21),

2. 10739688 - Method and apparatus for fabricating wafer by calculating process correction parameters (2020-08-11),

3. 10739685 - Process control method for lithographically processed semiconductor devices (2020-08-11),

4. 10699971 - Method for processing of a further layer on a semiconductor wafer (2020-06-30),

5. 10379447 - Method and apparatus for simulation of lithography overlay (2019-08-13),

6. 10310490 - Method and apparatus of evaluating a semiconductor manufacturing process (2019-06-04),

7. 10295914 - Method and apparatus for fabricating wafer by calculating process correction parameters (2019-05-21),

8. 10234401 - Method of manufacturing semiconductor devices by using sampling plans (2019-03-19),

9. 10008422 - Method for assessing the usability of an exposed and developed semiconductor wafer (2018-06-26),

10. 9543223 - Method and apparatus for fabricating wafer by calculating process correction parameters (2017-01-10),

11. 8440475 - Alignment calculation (2013-05-14),

12. 7783444 - Systems and methods of alternative overlay calculation (2010-08-24),

Title: The Innovative Contributions of Boris Habets

Introduction

Boris Habets is a prominent inventor based in Dresden, Germany. He has made significant contributions to the field of semiconductor technology, holding a total of 12 patents. His work focuses on improving lithography processes, which are crucial in the manufacturing of semiconductor devices.

Latest Patents

One of Boris Habets' latest patents is titled "Method and apparatus for simulation of lithography overlay." This invention discloses a method for simulating lithography overlay by storing alignment parameters, process control parameters, and overlay parameters. The method calculates alternative alignment and process control parameters to obtain simulated lithography overlay data. Another notable patent is the "Process control method for lithographically processed semiconductor devices." This patent describes a process where photoresist layers are exposed to an exposure beam, and the exposure parameter set is updated based on deviations from target feature characteristics. This innovation enhances the accuracy and efficiency of semiconductor manufacturing.

Career Highlights

Boris has worked with several notable companies in the semiconductor industry, including Qoniac GmbH and Qimonda AG. His experience in these organizations has allowed him to develop and refine his innovative ideas, contributing to advancements in lithography and semiconductor processing.

Collaborations

Boris has collaborated with several professionals in his field, including Stefan Buhl and Michiel Kupers. These collaborations have fostered a creative environment that has led to the development of groundbreaking technologies in semiconductor manufacturing.

Conclusion

Boris Habets is a distinguished inventor whose work has significantly impacted the semiconductor industry. His innovative patents and collaborations demonstrate his commitment to advancing technology in lithography processes. His contributions continue to shape the future of semiconductor manufacturing.

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