The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 21, 2022
Filed:
Aug. 08, 2019
Applicant:
Qoniac Gmbh, Dresden, DE;
Inventors:
Boris Habets, Dresden, DE;
Stefan Buhl, Dresden, DE;
Assignee:
Qoniac GmbH, Dresden, DE;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/20 (2006.01); G03F 9/00 (2006.01); G01N 21/95 (2006.01);
U.S. Cl.
CPC ...
G03F 7/705 (2013.01); G01N 21/9501 (2013.01); G03F 7/70633 (2013.01); G03F 9/7046 (2013.01); G03F 9/7088 (2013.01);
Abstract
A method for simulation of lithography overlay is disclosed which comprises storing alignment parameters used to align a semiconductor wafer prior to a lithography step; storing process control parameters used during the lithography step on the semiconductor wafer, storing overlay parameters measured after the lithography step, calculating alternative alignment parameters and alternative process control parameters. The alternative alignment parameters and the alternative process control parameters are added to cleansed overlay parameters to obtain simulated lithography overlay data.