Penang, Malaysia

Boon Siew Ooi


Average Co-Inventor Count = 5.0

ph-index = 1

Forward Citations = 4(Granted Patents)


Company Filing History:


Years Active: 2003

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1 patent (USPTO):Explore Patents

Title: The Innovative Contributions of Boon Siew Ooi

Boon Siew Ooi is a notable inventor based in Penang, Malaysia. He has made significant contributions to the field of photonic integrated circuits (PICs) through his innovative techniques. His work focuses on enhancing the fabrication processes of advanced optical devices.

Latest Patents

Boon Siew Ooi holds a patent for a technique titled "Quantum well intermixing." This invention introduces a novel method based on gray scale mask patterning, which requires only a single lithography and etching step to produce varying thicknesses of SiO implantation masks in selected regions. Following this, a one-step IID process achieves selective area intermixing. This low-cost and straightforward technique is particularly beneficial for the fabrication of PICs and wavelength division multiplexing (WDM) sources. By utilizing the gray scale mask technique in IID, the bandgap energy of quantum well materials can be adjusted across a wafer. This capability not only facilitates the integration of monolithic multiple-wavelength lasers but also extends to the incorporation of modulators and couplers on a single chip. Additionally, this technique aids in the design and fabrication of superluminescent diodes (SLDs) by broadening the gain spectrum post-epitaxial growth.

Career Highlights

Boon Siew Ooi is associated with Ntu Ventures Pte. Ltd., where he continues to push the boundaries of innovation in photonics. His work has garnered attention for its potential applications in various optical technologies.

Collaborations

He has collaborated with notable colleagues, including Yee Loy Lam and Yuen Chuen Chan, to further advance his research and development efforts.

Conclusion

Boon Siew Ooi's contributions to the field of photonics through his patent on quantum well intermixing exemplify his innovative spirit and dedication to advancing technology. His work not only enhances the fabrication of optical devices but also paves the way for future advancements in the industry.

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