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For the Inventor, By the Inventor

Daejun-Shi, South Korea

Bong Seok Moon

This inventor holds 4 USPTO granted patents. Top assignee: Samsung Electronics Co., Ltd.. Active years: 2003-2004.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Bong Seok Moon. Retrieved from https://idiyas.com/inventor/bong-seok-moon-isjrmip4

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 4

% Patents Active = 50.0

Average Co-Inventor Count = 4.4

ph-index = 2

Forward Citations = 16(Granted Patents)


Location History:

  • Daejun-Shi, KR (2003 - 2004)
  • Daejun, KR (2004)

Company Filing History:

goldMedal4 out of 132,108 
 
Samsung Electronics Co., Ltd.
 patents

Years Active: 2003-2004

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4 patents (USPTO):Explore Patents
1. 6762268 - Acetal group containing norbornene copolymer for photoresist, method for producing the same and photoresist composition containing the same (2004-07-13),
2. 6753127 - Norbornene-based copolymer for photoresist, preparation method thereof, and photoresist composition comprising the same (2004-06-22),
3. 6699409 - Method for producing dot-printless light guide plate for liquid crystal display device using norbornene copolymer (2004-03-02),
4. 6600006 - Positive-type photosensitive polyimide precursor and composition comprising the same (2003-07-29),

Title: Inventor Spotlight: Bong Seok Moon

Introduction

Bong Seok Moon is a notable inventor based in Daejeon-Shi, South Korea, recognized for his contributions to the field of polymer chemistry, particularly in the development of advanced photoresist materials. With a total of four patents to his name, he has demonstrated his innovative capacity and influence in the semiconductor industry.

Latest Patents

Bong Seok Moon's latest patents focus on the creation of specialized copolymers for photoresist applications. One significant patent describes an acetal group containing norbornene copolymer that exhibits excellent transparency at wavelengths under 250 nm. This copolymer is noted for its resolution, sensitivity, dry etching resistance, and strong adhesion properties. Another patent details a norbornene-based copolymer, which showcases high transparency to 193 nm light, improved etching resistance, and a substantial difference in dissolving rates between exposed and non-exposed areas, making it an excellent candidate for ArF exposure photoresist materials in semiconductor device fabrication.

Career Highlights

Bong Seok Moon is currently employed at Samsung Electronics Co., Ltd., a leading company in the electronics and semiconductor industry. His work has significantly contributed to the advancement of technologies used in the production of semiconductor devices, which are vital for numerous electronic applications.

Collaborations

During his career, Bong Seok Moon has collaborated with esteemed colleagues including Jung Han Shin and Ouck Han. These collaborations have fostered innovative research and development efforts, enhancing the overall impact of their work in the field.

Conclusion

Bong Seok Moon exemplifies the spirit of innovation in polymer chemistry and semiconductor technology. His patents not only reflect significant advancements in photoresist materials but also demonstrate the importance of collaboration in achieving groundbreaking developments. His contributions continue to propel the field forward, supporting the ongoing evolution of technology in the electronics sector.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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