The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 6762268 B1

PDF
Full Text
Expired
Date of Patent:
Jul. 13, 2004

Filed:

Apr. 22, 2002
Applicant:
Inventors:

Jung Han Shin, Daejun-Shi, KR;

Bong Seok Moon, Daejun-Shi, KR;

Ouck Han, Daejun-Shi, KR;

Keun Byoung Yoon, Daejun-Shi, KR;

Eun Sil Han, Daejun-Shi, KR;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C08F / ;
U.S. Cl.
CPC ...
C08F / ;
Abstract

An acetal group containing norbornene-based copolymer useful for a photoresist composition, a method for producing the same, and a photoresist composition containing the same are disclosed. According to the present invention, a copolymer of the present invention has excellent transparency at a wavelength of not more than about 250 nm, excellent resolution, excellent sensitivity, dry etching resistance and excellent adhesion to the substrate.


Find Patent Forward Citations

Shin, Jung. (2004). Acetal group containing norbornene copolymer for photoresist, method for producing the same and photoresist composition containing the same (U.S. Patent No. 6762268). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6762268

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