Company Filing History:
Years Active: 2012-2025
Title: Boaz Pnini: Innovator in Lithography Technology
Introduction
Boaz Pnini is a notable inventor based in Goeggingen, Germany. He has made significant contributions to the field of lithography, particularly in the semiconductor industry. With a total of 4 patents to his name, Pnini's work has advanced the technology used in precision alignment and adjustment of lithography apparatus.
Latest Patents
Pnini's latest patents include a method for adjusting a first element of a lithography apparatus towards a second element using a tunable spacer. This innovative method involves determining the actual and nominal locations of the first element, unloading the tunable spacer, adjusting its height, and then reloading it to achieve precise alignment. Another significant patent is for an actuator device designed for aligning an element in a projection exposure apparatus for semiconductor lithography. This device features a first actuator unit secured to a support structure and a second actuator unit that can be attached to the element, allowing for adjustable positioning through a force-locking mechanism.
Career Highlights
Throughout his career, Boaz Pnini has worked with prominent companies in the technology sector. He has been associated with Carl Zeiss SMT GmbH, a leader in optical systems and lithography technology. Additionally, he has contributed his expertise at Fiberzone Networks Ltd., where he further honed his skills in innovative technologies.
Collaborations
Pnini has collaborated with notable professionals in his field, including Ze'ev Ganor and Rahav Cohen. These partnerships have likely enriched his work and contributed to the advancements in lithography technology.
Conclusion
Boaz Pnini's contributions to lithography technology through his patents and career experiences highlight his role as an influential inventor. His innovative methods and devices continue to impact the semiconductor industry positively.