Bo-Wei Shih

Title: Bo-Wei Shih: Innovator in Semiconductor Technology

Introduction

Bo-Wei Shih is a notable inventor based in Changhua County, Taiwan. He has made significant contributions to the field of semiconductor technology, particularly through his innovative patent work. His expertise and dedication to advancing technology have positioned him as a key figure in the industry.

Latest Patents

Bo-Wei Shih holds a patent titled "Mask and method for forming the same." This patent describes a method that includes forming a reflective multilayer over a substrate. It also involves depositing a first capping layer over the reflective multilayer, wherein the first capping layer is made of a ruthenium-containing material or a chromium-containing material. The method further includes performing a treatment to the first capping layer to introduce nitrogen or fluorine into it, forming an absorption layer over the first capping layer, and patterning the absorption layer. This innovative approach enhances the efficiency and effectiveness of semiconductor manufacturing processes.

Career Highlights

Bo-Wei Shih is currently employed at Taiwan Semiconductor Manufacturing Company Limited, a leading organization in the semiconductor industry. His work at this prestigious company allows him to contribute to cutting-edge advancements in technology. His patent portfolio, which includes 1 patent, reflects his commitment to innovation and excellence in his field.

Collaborations

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Conclusion

Bo-Wei Shih's contributions to semiconductor technology through his innovative patent work exemplify his role as a leading inventor in the industry. His dedication to advancing technology continues to impact the field positively.