Bjorn Hansson

Title: Innovations of Bjorn Hansson in EUV Light Source Technology

Introduction

Bjorn Hansson is a notable inventor based in La Jolla, California. He has made significant contributions to the field of extreme ultraviolet (EUV) light source technology. With a total of two patents to his name, his work has implications for various applications in the semiconductor industry.

Latest Patents

Hansson's latest patents include a "Laser Produced Plasma EUV Light Source" and a "Source Material Collection Unit for a Laser Produced Plasma EUV Light Source." The first patent describes an EUV light source that incorporates a laser source, such as a CO laser, a plasma chamber, and a beam delivery system. This innovative design allows for the efficient generation of EUV light through the interaction of a laser beam with plasma. The second patent focuses on a system that utilizes a laser beam to irradiate source materials like tin and its alloys, creating plasma that emits EUV light. This patent also details a beam dump and a temperature control system to optimize performance.

Career Highlights

Bjorn Hansson is currently employed at Cymer, Inc., a company renowned for its advancements in photolithography technology. His work at Cymer has positioned him as a key player in the development of next-generation EUV light sources, which are critical for the manufacturing of smaller and more powerful semiconductor devices.

Collaborations

Hansson has collaborated with notable colleagues, including Alexander Igorevich Ershov and William N Partlo. These collaborations have fostered an environment of innovation and have contributed to the successful development of cutting-edge technologies in the field.

Conclusion

Bjorn Hansson's contributions to EUV light source technology exemplify the impact of innovative thinking in the semiconductor industry. His patents and work at Cymer, Inc. highlight the importance of advancements in this field for future technological developments.