The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 13, 2009
Filed:
Aug. 25, 2006
Alexander N. Bykanov, San Diego, CA (US);
Bjorn Hansson, Bromma, SE;
Alexander N. Bykanov, San Diego, CA (US);
Bjorn Hansson, Bromma, SE;
Cymer, Inc., San Diego, CA (US);
Abstract
An EUV light source is disclosed which may comprise a laser source generating a laser beam and a source material, e.g. tin, SnBr, SnBr, SnH, tin-gallium alloys, tin-indium alloys, tin-indium-gallium alloys or combinations thereof, that is irradiated by the laser beam to form a plasma and emit EUV light. The EUV light source may also comprise a beam dump positioned to receive the laser beam and a system controlling the temperature of the beam dump within a pre-selected range. In one embodiment, the source material may be irradiated at an irradiation zone and the source may further comprises a receiving structure formed with a surface shaped to receive source material ejected from the irradiation zone and direct the received source material for subsequent collection. The receiving structure and the beam dump may be formed as a single integrated unit.