Cohoes, NY, United States of America

Bhaskar Nagabhirava


Average Co-Inventor Count = 4.4

ph-index = 3

Forward Citations = 30(Granted Patents)


Location History:

  • Albany, NY (US) (2014 - 2016)
  • Cohoes, NY (US) (2018 - 2020)

Company Filing History:


Years Active: 2014-2025

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8 patents (USPTO):

Title: Bhaskar Nagabhirava: Innovator in Semiconductor Technology

Introduction

Bhaskar Nagabhirava is a prominent inventor based in Cohoes, NY (US), known for his significant contributions to semiconductor technology. With a total of 8 patents to his name, he has made remarkable advancements in the field, particularly in the area of patterning semiconductor substrates.

Latest Patents

One of his latest patents is titled "Multi-layer hardmask for defect reduction in EUV patterning." This invention relates to methods, apparatus, and systems that utilize a multi-layer hardmask in the context of patterning a semiconductor substrate using extreme ultraviolet photoresist. The multi-layer hardmask consists of an upper layer that includes a metal-containing material, such as a metal oxide, a metal nitride, or a metal oxynitride, and a lower layer that includes an inorganic dielectric silicon-containing material. Together, these layers provide excellent etch selectivity and reduce the formation of defects such as microbridges and line breaks. Certain embodiments of this patent also relate to the deposition and etching of the multi-layer hardmask.

Another notable patent is "Polymerization protective liner for reactive ion etch in patterning." This invention provides methods of patterning vias and trenches using a polymerization protective liner after forming a lower patterned mask layer used for etching trenches on a semiconductor substrate. The methods involve forming a polymerization protective liner either nonconformally or conformally using silicon tetrachloride and methane polymerization. These polymerization protective liners may also be sacrificial.

Career Highlights

Throughout his career, Bhaskar has worked with leading companies in the semiconductor industry, including Lam Research Corporation and International Business Machines Corporation (IBM). His work has significantly impacted the development of advanced semiconductor manufacturing techniques.

Collaborations

Bhaskar has collaborated with notable professionals in the field, including Michael Goss and Adarsh Basavalingappa. These collaborations have further enhanced his contributions to semiconductor technology.

Conclusion

Bhaskar Nagabhirava's innovative work in semiconductor technology, particularly in the development of advanced patterning techniques, has established him as a key figure in the industry. His patents reflect a commitment to reducing defects and improving manufacturing processes, making a lasting impact on the field.

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