Bernard M Frey

Title: The Innovative Contributions of Bernard M Frey

Introduction

Bernard M Frey, based in Berkeley, CA, is a notable inventor with a focus on advancements in chemical mechanical polishing (CMP) technology. With three patents to his name, Frey's innovative work has significantly impacted the field of material removal processes.

Latest Patents

Frey's most recent patents exemplify his commitment to enhancing efficiency in polishing applications. His patent titled "Chemical Mechanical Polishing Endpoint Detection" describes methods and systems for in-situ endpoint detection during CMP processes. By employing an optical detection system, this invention aids in detecting the endpoint while removing planar conductive layers. The use of an optically transparent polishing belt allows for endpoint detection at any point on the belt, ensuring the process can be terminated or adjusted as needed.

Another significant patent, "Single Drive System for a Bi-Directional Linear Chemical Mechanical Polishing Apparatus," offers a creative solution for producing bi-directional polishing using a flexible pad. This invention features a horizontal drive assembly that moves a slide member across rails. It efficiently translates the rotational movement of a motor into the required horizontal movements, significantly improving the polishing process of wafers.

Career Highlights

Throughout his career, Bernard M Frey has made noteworthy contributions to the field while working with companies like Nutool, Inc. His expertise and innovative mindset have led to the development of advanced polishing systems and methods, further establishing his reputation as a skilled inventor.

Collaborations

Frey has collaborated with various professionals, including notable coworkers such as Douglas W Young and Yuchun Wang. These collaborations have likely enriched his projects and contributed to the successful realization of his innovations.

Conclusion

Bernard M Frey's innovative patents and collaborations have positioned him as a key figure in the advancements of chemical mechanical polishing technology. His work not only demonstrates a commitment to innovation but also offers practical applications that enhance the efficiency of industrial processes. As he continues to push boundaries in this field, his contributions will leave a lasting impact on the industry.