This inventor holds 1 USPTO granted patent and 1 published patent application. Top assignee: Taiwan Semiconductor Manufacturing Comp. Ltd.. Active years: 2022.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2022
Title: Benny Ku - Innovator in Extreme Ultraviolet Light Technology.
Introduction
Benny Ku is a prominent inventor based in Hsinchu, Taiwan. He has made significant contributions to the field of extreme ultraviolet (EUV) technology, particularly in the development of reflective structures that enhance the efficiency of EUV lithography.
Latest Patents
Benny Ku holds a patent for an innovative "Extreme ultraviolet light reflective structure including nano-lattice and manufacturing method thereof." This patent describes an EUV reflective structure that consists of a substrate and multiple pairs of silicon (Si) and molybdenum (Mo) layers. The Si layer is designed with a plurality of cavities, which improves the performance of the reflective structure.
Career Highlights
Benny Ku is currently employed at Taiwan Semiconductor Manufacturing Company Ltd., a leading firm in the semiconductor industry. His work focuses on advancing technologies that are crucial for the production of cutting-edge microchips.
Collaborations
Throughout his career, Benny has collaborated with notable colleagues, including Wen-Hao Cheng and Keith Kuang-Kuo Koai. These partnerships have contributed to the successful development of innovative technologies in the semiconductor field.
Conclusion
Benny Ku's contributions to extreme ultraviolet light technology and his innovative patent demonstrate his commitment to advancing the semiconductor industry. His work continues to influence the development of efficient manufacturing methods for microchips.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile